Polysilane anti-reflective layer for deep UV lithography

Journal of Photopolymer Science and Technology

Volumn 12, Issue 4, 1999, Pages 663-668

  Sato, Yasuhiko ^a   Miyoshi, Seiro ^a   Matsuyama, Hideto ^a   Onishi, Yasunobu ^a   Nakano, Yoshihiko ^a   Hayase, Shuji ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Anti reflection; Anti reflective layer; ARL; DUV; Polysilane

Indexed keywords

EID: 0012536412     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.663     Document Type: Article

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