Planar RF induction plasma coupling efficiency

Plasma Sources Science and Technology

Volumn 3, Issue 4, 1994, Pages 460-464

  Hopwood, J ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36149037318     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/3/4/002     Document Type: Article

References (10)

1. Application of a low-pressure radio frequency discharge source to polysilicon gate etching
2. Fundamental characteristics of built-in high-frequency coil-type sputtering apparatus
3. Electron cyclotron resonance microwave discharges for etching and thin-film deposition
4. Novel radio-frequency induction plasma processing techniques