RPECVD thin silicon carbonitride films using hexamethyldisilazane

Journal De Physique. IV : JP

Volumn 9 pt 2, Issue 8, 1999, Pages

  Fainer, N I ^a   Kosinova, M L ^a   Rumyantsev, Yu M ^a   Kuznetsov, F A ^a  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CRYSTAL STRUCTURE; HELIUM; MICROHARDNESS; PHASE COMPOSITION; PRESSURE; SILICON COMPOUNDS; TEMPERATURE; THIN FILMS;

HEXAMETHYLDISILAZANE; SILICON CARBONITRIDE FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0033187964     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1999897     Document Type: Article

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