Improvement in the stability of amorphous SiN-BN films prepared by hybrid-plasma-enhanced chemical vapour deposition

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 305-307

  Yasui, Kanji ^a   Itoh, Hidetaka ^a   Akahane, Tadashi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Boron nitride; Hydrogen; Nitrides; Plasma processing and deposition; Silicon nitride; Structural properties

Indexed keywords

AMMONIA; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; FILM PREPARATION; NITRIDES; PLASMA APPLICATIONS; SILANES; SILICON NITRIDE; STABILITY; STRUCTURE (COMPOSITION); TERNARY SYSTEMS;

BORON NITRIDE; DIBORANE; HYBRID PLASMA DEPOSITION; MICROWAVE PLASMA;

AMORPHOUS FILMS;

EID: 0030218524     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08661-0     Document Type: Article

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