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Volumn 38, Issue 8 A, 1999, Pages

Characterization of a GaN bipolar junction transistor after operation at 300 for over 300 h

Author keywords

[No Author keywords available]

Indexed keywords

HIGH TEMPERATURE OPERATIONS; INTERFACES (MATERIALS); MOLECULAR BEAM EPITAXY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; RELIABILITY; SEMICONDUCTING GALLIUM COMPOUNDS; TEMPERATURE; THICK FILMS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0033171966     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l851     Document Type: Article
Times cited : (66)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.