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Volumn 38, Issue 8 A, 1999, Pages
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Characterization of a GaN bipolar junction transistor after operation at 300 for over 300 h
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Author keywords
[No Author keywords available]
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Indexed keywords
HIGH TEMPERATURE OPERATIONS;
INTERFACES (MATERIALS);
MOLECULAR BEAM EPITAXY;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
RELIABILITY;
SEMICONDUCTING GALLIUM COMPOUNDS;
TEMPERATURE;
THICK FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
BEAM EQUIVALENT PRESSURE;
BIPOLAR JUNCTION TRANSISTOR;
GAS SOURCE MOLECULAR BEAM EPITAXY;
KNUDSEN EFFUSION CELLS;
QUADRUPOLE MASS SPECTROMETER;
BIPOLAR TRANSISTORS;
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EID: 0033171966
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.38.l851 Document Type: Article |
Times cited : (66)
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References (13)
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