Magnetic neutral loop discharge (NLD) plasma and application to SiO2 etching process

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 7 B, 1999, Pages 4296-4300

  Chen, Wei ^a   Hayashi, Toshio ^a   Itoh, Masahiro ^a   Morikawa, Yasuhiro ^a   Sugita, Kippei ^b   Shindo, Haruo ^b   Uchida, Taijiro ^a  

^a ULVAC INC   (Japan)

^b TOKAI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE TRANSFER; ELECTRON BEAMS; MASS SPECTROMETERS; PLASMA APPLICATIONS; PLASMA SHEATHS; SILICA; SILICON WAFERS;

ANISOTROPIC ETCHING; DIELECTRIC VACUUM WALL MATERIAL; HIGH DENSITY PLASMA; INDUCTIVELY COUPLED PLASMA; MAGNETIC COIL; MAGNETIC NEUTRAL LOOP DISCHARGE PLASMA; SILICON DIOXIDE ETCHING;

PLASMA ETCHING;

EID: 0033157716     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4296     Document Type: Article

References (10)

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