Magnetically neutral loop discharged plasma sources and system

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1529-1536

  Uchida, Taijiro ^a  

^a ULVAC INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALTERNATING ELECTRIC FIELD; DISCHARGED PLASMA; ETCHING PROCESS; ETCHING RATE; EXPERIMENTAL DATA; GAS PRESSURES; HIGH DENSITY PLASMAS; HIGH SELECTIVITY; INDUCTION COILS; INDUCTIVE COUPLINGS; LOW PRESSURES; NLD PLASMA; PLASMA PROCESSING; POWER ABSORPTION; STEADY CURRENT; THERMALIZATION;

ANISOTROPIC ETCHING; ELECTRIC FIELDS; GAS ABSORPTION; PERMITTIVITY; PLASMAS;

PLASMA DIAGNOSTICS;

EID: 0038632788     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581182     Document Type: Article

References (7)

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