Influence of a modulated magnetic field on the behavior of particulates in silane plasma CVD

Surface and Coatings Technology

Volumn 97, Issue 1-3, 1997, Pages 366-371

  Yang, Sung Chae ^a   Maemura, Yoko ^a   Tazoe, Kazuhiko ^a   Matsuda, Yoshinobu ^a   Fujiyama, Hiroshi ^a  

^a NAGASAKI UNIVERSITY   (Japan)

Author keywords

Fluctuation of discharge current; Modulated magnetic field; Silicon particle

Indexed keywords

AMORPHOUS FILMS; CATHODES; CHEMICAL VAPOR DEPOSITION; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; LIGHT SCATTERING; MAGNETIC FIELD EFFECTS; SILANES; THIN FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); SPATIALLY INTEGRATED MIE SCATTERING INTENSITY (SIMSI);

AMORPHOUS SILICON;

EID: 0031345416     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00164-3     Document Type: Article

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