Comparison of laser produced and gas discharge based EUV sources for different applications

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 465-468

  Lebert, R ^a   Bergmann, K ^a   Schriever, G ^a   Neff, W ^b  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LASER PRODUCED PLASMAS; NEODYMIUM LASERS; PHOTOLITHOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); GAS DISCHARGE BASED PINCH PLASMAS;

ULTRAVIOLET RADIATION;

EID: 0033131587     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00041-6     Document Type: Article

References (11)

1. 1. R. Lebert, D. Rothweiler, A. Engel, K. Bergmann, W. Neff, Opt. Quant. Electr., 28 (1996) 241-259
2. 2. R. Lebert, K. Bergmann, G. Schriever, W. Neff, published with this issue
3. 3. M. Hawrluk, N. M. Ceglio, Appl. Optics, 32 (1993) 7062
4. 4. R. Lebert, W. Neff, D. Rothweiler, J. X-Ray Sci. Technol, 6 (1996) 107-140
5. 5. R. Lebert, G. Schriever, T. Wilhein, B. Niemann, J. Appl. Phys.( 1998)
6. 6. G. Schriever, S. Mager, A. Naweed, A. Engel, K. Bergmann, R. Lebert, Appt. Opt. 37(7) (1998) 1243-1248
7. 7. M. A. Klosner, H. A. Bender, W. T. Silfvast, Opt. Let. 22 (1997) 34-36
8. 8. G. Schriever, R. Lebert, Rev. Sci. Instrum. 68(9) (1997) 3301-3306
9. 9. G. Schriever, K. Bergmann and R. Lebert, J. Appl. Phys. 83 (9) 4566-45471 (1998)
10. 10. L. Rymell, H. Hertz, Rev. Sci. Instrum. 66(10) (1995) 4916-4920
11. 11. P. Celliers, L. B. Da Silva, C. B. Dane, S. Mrowka, N. Norton, J. Harder, L. Hackel, H. Fiedorowicz, A. Bartnik, J. R. Maldonado, J. A. Abate, J. Appl. Phys. 79(11) (1996) 8258-8268