Electrical properties of sputtered (Ba, Sr)TiO3 thin films prepared by two-step deposition method

Journal of Electronic Materials

Volumn 28, Issue 4, 1999, Pages

  Lee, Byoung Taek ^a   Kim, Wan Don ^a   Lee, Ki Hoon ^a   Lim, Han Jin ^a   Kang, Chang Seok ^a   Hideki, Horii ^a   Joo, Suk Ho ^a   Park, Hong Bae ^a   Yoo, Cha Young ^a   Lee, Sang In ^a   Lee, Moon Yong ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BARIUM COMPOUNDS; CURRENT DENSITY; ELECTRIC POTENTIAL; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITROGEN; PERMITTIVITY; TEMPERATURE;

BARIUM STRONTIUM TITANIUM OXIDE THIN FILMS; CRYSTALLINITY; MAIN LAYER; POST ANNEALING; SEED LAYER; TWO STEP RADIO FREQUENCY MAGNETRON SPUTTERING;

THIN FILMS;

EID: 0033116680     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-999-0240-6     Document Type: Article

References (6)

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