In-situ monitoring of chemical vapor deposition at ambient pressure by surface-enhanced raman spectroscopy: Initial growth of tantalum(V) oxide on platinum [1]

Journal of the American Chemical Society

Volumn 121, Issue 39, 1999, Pages 9219-9220

  Chan, Ho Yeung H ^a   Takoudis, Christos G ^b   Weaver, Michael J ^a  

^a PURDUE UNIVERSITY   (United States)

^b 1120 Science and Engineering Offices   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METAL OXIDE; PLATINUM; TANTALUM;

ADSORPTION; DIELECTRIC CONSTANT; FILM; LETTER; MONITORING; PRESSURE; RAMAN SPECTROMETRY; VAPOR; VIBRATION;

EID: 0032879510     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja991707s     Document Type: Letter

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