Investigation of chemical vapor deposition of silicon by surface-enhanced Raman scattering

Thin Solid Films

Volumn 295, Issue 1-2, 1997, Pages 5-7

  Motte, P ^a   Lopez Rios T ^a  

^a LABORATOIRE DE CRISTALLOGRAPHIE   (France)

Author keywords

Chemical vapour deposition; Deposition process; Raman scattering; Silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; HEAT TREATMENT; RAMAN SCATTERING; SILVER; SUBSTRATES; THIN FILMS;

SURFACE ENHANCED RAMAN SCATTERING (SERS);

SEMICONDUCTING SILICON;

EID: 0031072696     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09505-3     Document Type: Article

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