Invited talk lateral isolation in SOI CMOS technology

1990 IEEE SOS/SOI Technology Conference, Proceedings

Volumn , Issue , 1990, Pages 117-118

  Haond, M ^a  

^a ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; SYSTEMS ENGINEERING;

CMOS PROCESSS; INVITED TALK; LATCH-UPS; LATERAL ISOLATION; SILICON ETCHING; SOI CMOS; SUBMICRON CMOS;

CMOS INTEGRATED CIRCUITS;

EID: 33749756324     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SOSSOI.1990.145737     Document Type: Conference Paper

References (2)

1. M. Matloubian, R. Sundaresan and H. Lu, IEEE Trans, on Electron Dev., ED- 36, p. 938, 1989.
2. M. Haond, O. LeNéel, G. Mascarin and J.-P. Gonchond, Proc. SOS/SOI Technology Conf., p. 68, 1989.