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Volumn 9, Issue 2 PART 2, 1999, Pages 1712-1715
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Dependence of critical temperature and resistivity of thin film Nb47wt%Ti on magnetron sputtering conditions
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Author keywords
[No Author keywords available]
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Indexed keywords
AUGER ELECTRON SPECTROSCOPY;
CATHODES;
CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY);
MAGNETRON SPUTTERING;
MORPHOLOGY;
NIOBIUM COMPOUNDS;
SCANNING ELECTRON MICROSCOPY;
SPUTTER DEPOSITION;
SUPERCONDUCTING TRANSITION TEMPERATURE;
SUPERCONDUCTIVITY;
CATHODE POWER;
CRITICAL TEMPERATURE;
FLUX PINNING;
INTERSTITIAL ATOMS;
SUPERCONDUCTING FILMS;
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EID: 0032681419
PISSN: 10518223
EISSN: None
Source Type: Journal
DOI: 10.1109/77.784783 Document Type: Article |
Times cited : (2)
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References (15)
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