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Volumn 9, Issue 2 PART 2, 1999, Pages 1712-1715

Dependence of critical temperature and resistivity of thin film Nb47wt%Ti on magnetron sputtering conditions

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CATHODES; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); MAGNETRON SPUTTERING; MORPHOLOGY; NIOBIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; SUPERCONDUCTING TRANSITION TEMPERATURE; SUPERCONDUCTIVITY;

EID: 0032681419     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.784783     Document Type: Article
Times cited : (2)

References (15)
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  • 5
    • 0002755280 scopus 로고    scopus 로고
    • Appl
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  • 9
    • 0030194192 scopus 로고    scopus 로고
    • and R.E. Somekh, vol. 14, pp. 21692174, 1996.
    • C.Hudson and R.E. Somekh, J. Vac. Sei. Tcchiwl. A, vol. 14, pp. 21692174, 1996.
    • J. Vac. Sei. Tcchiwl. A
    • Hudson, C.1
  • 13
    • 0020811117 scopus 로고    scopus 로고
    • Stress and Property Control in Sputtered Metal Films Without Substrate Bias
    • vol. 107, pp. 353-358, 1983.
    • D.W. Hoffman, Stress and Property Control In Sputtered Metal Films Without Substrate Bias, Thin Solid Films, vol. 107, pp. 353-358, 1983.
    • Thin Solid Films
    • Hoffman, D.W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.