INTERNAL STRESSES IN TITANIUM, NICKEL, MOLYBDENUM, AND TANTALUM FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING.

J Vac Sci Technol

Volumn 14, Issue 1, 1976, Pages 164-168

  Thornton, John A ^a   Hoffman, David W ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

MOLYBDENUM AND ALLOYS - THIN FILMS; NICKEL AND ALLOYS - THIN FILMS; SPUTTERING; TANTALUM AND ALLOYS - THIN FILMS; TITANIUM AND ALLOYS - THIN FILMS;

FILMS;

EID: 0016903555     PISSN: None     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (29)