Stress and property control in sputtered metal films without substrate bias

Thin Solid Films

Volumn 107, Issue 4, 1983, Pages 353-358

  Hoffman, D W ^a  

^a FORD MOTOR COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METALS AND ALLOYS - THIN FILMS; SPUTTERING;

SUBSTRATES;

FILMS;

EID: 0020811117     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(83)90296-1     Document Type: Article

References (7)

1. Correlation between the ion bombardment during film growth of Pd films and their structural and electrical properties
2. Internal stresses in Cr, Mo, Ta, and Pt films deposited by sputtering from a planar magnetron source