On the number of fast interface states of standard CMOS technologies

IEEE Electron Device Letters

Volumn 20, Issue 6, 1999, Pages 283-285

  Jungemann, C ^a   Meinerzhagen, B ^a   Eller, M ^b  

^a UNIVERSITY OF BREMEN   (Germany)

^b SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

HETEROJUNCTIONS; MOS DEVICES; MOSFET DEVICES; SEMICONDUCTOR DEVICE MANUFACTURE;

INTERFACE STATE (IS) DENSITY;

CMOS INTEGRATED CIRCUITS;

EID: 0032649018     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.767099     Document Type: Article

References (11)

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