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Volumn 43, Issue 7, 1999, Pages 1189-1193

Electrical characteristics of rf-magnetron sputtered BaTa2O6 thin film

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM COMPOUNDS; CAPACITANCE; ELECTRIC FIELD EFFECTS; ELECTRIC PROPERTIES; ELECTROCHEMICAL ELECTRODES; INDIUM COMPOUNDS; LEAKAGE CURRENTS; OPTICAL PROPERTIES; PERMITTIVITY; THERMAL EFFECTS;

EID: 0032633602     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(99)00057-X     Document Type: Article
Times cited : (4)

References (16)
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    • 0030397789 scopus 로고    scopus 로고
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    • McKinley K.A., Sandler N.P. Tantalum pentoxide for advanced DRAM applications. Thin Solid Films. 290:1996;440-446.
    • (1996) Thin Solid Films , vol.290 , pp. 440-446
    • McKinley, K.A.1    Sandler, N.P.2
  • 6
    • 0031165540 scopus 로고    scopus 로고
    • 2O annealing
    • 2O annealing. ED. 44:1997;1027-1029.
    • (1997) ED , vol.44 , pp. 1027-1029
    • Sun, S.C.1    Chen, T.F.2
  • 7
    • 0031099608 scopus 로고    scopus 로고
    • Surface modification of indium tin oxide by plasma treatment: An effective method to improve the efficiency, brightness, and reliability of organic light emitting devices
    • Wu C.C., Wu C.J., Stum J.C., Kahn A. Surface modification of indium tin oxide by plasma treatment: An effective method to improve the efficiency, brightness, and reliability of organic light emitting devices. Appl. Phys. Lett. 70:1997;1348-1350.
    • (1997) Appl. Phys. Lett. , vol.70 , pp. 1348-1350
    • Wu, C.C.1    Wu, C.J.2    Stum, J.C.3    Kahn, A.4
  • 9
    • 36448998883 scopus 로고
    • Transferred charge analysis of evaporated ZnS:Mn alternating-current thin film electroluminescent device
    • Myers R., Wager J.E. Transferred charge analysis of evaporated ZnS:Mn alternating-current thin film electroluminescent device. J. Appl. Phys. 71:1992;4040.
    • (1992) J. Appl. Phys. , vol.71 , pp. 4040
    • Myers, R.1    Wager, J.E.2
  • 10
    • 0017006618 scopus 로고
    • Chemical vapor deposition of tantalum pentaoxide films for metal-insulator-semiconductor devices
    • Kaplan E., Balog M., Frohman-Bentchkowsky O. Chemical vapor deposition of tantalum pentaoxide films for metal-insulator-semiconductor devices. J. Electrochem. Soc. 123:1976;1570-1573.
    • (1976) J. Electrochem. Soc. , vol.123 , pp. 1570-1573
    • Kaplan, E.1    Balog, M.2    Frohman-Bentchkowsky, O.3
  • 11
  • 14
    • 0017017243 scopus 로고
    • A simple method for the determination of the optical constant n, k and the thickness of a weakly absorbing thin film
    • Manifacier J.C., Gasiot J., Fillard J.P. A simple method for the determination of the optical constant n, k and the thickness of a weakly absorbing thin film. J. of Phys. E. 9:1976;1002-1004.
    • (1976) J. of Phys. E. , vol.9 , pp. 1002-1004
    • Manifacier, J.C.1    Gasiot, J.2    Fillard, J.P.3
  • 15
    • 0001896250 scopus 로고
    • Transparent gate silicon photodetectors
    • Schroder D.K. Transparent gate silicon photodetectors. ED. 25:1978;90-97.
    • (1978) ED , vol.25 , pp. 90-97
    • Schroder, D.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.