Impact of surface properties on the dielectric breakdown for polycrystalline and multilayered BaTiO3 thin films

Journal of Applied Physics

Volumn 82, Issue 12, 1997, Pages 6203-6208

  Oh, Jeong Hoon ^a   Lee, Y H ^a   Ju, B K ^a   Shin, D K ^a,b   Park, Chang Yub ^a,c   Oh, M H ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Orion Electric Co   (South Korea)

^c Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000453025     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366505     Document Type: Article

References (14)

1. M. H. Song, Y. H. Lee, T. S. Hahn, and M. H. Oh, J. Cryst. Growth 167, 157 (1996).
2. M. H. Song, Y. H. Lee, T. S. Hahn, M. H. Oh, and K. H. Yoon, J. Kor. Cream. Soc. 32, 761 (1995).
3. M. H. Song, Y. H. Lee, T. S. Hahn, and M. H. Oh, J. Appl. Phys. 79, 3744 (1996).
4. K. Yamabe and K. Taniguchi, IEEE Trans. Electron Devices ED-32, 423 (1985).
5. C. F. Chen, C. Y. Wu, M. K. Lee, and C. N. Chen, IEEE Trans. Electron Devices ED-34, 1540 (1987).
6. P. C. Li, W. Ting, and D. L. Kwong, Electron. Lett. 25, 665 (1989).
7. J. Ahn, A. Joshi, G. Q. Lo, and Dim-Lee Kwong, IEEE Electron Device Lett. EDL-13, 513 (1992).
8. A. B. Joshi, D. L. Kwong, and S. Lee, Appl. Phys. Lett. 60, 1489 (1992).
9. X. Li, J. T. Hsu, P. Aum, D. Chan, J. Rembetski, and C. R. Viswanathan, IEEE Electron Device Lett. EDL-14, 91 (1993).
10. Z. H. Liu, P. Nee, P. K. Ko, C. Hu, C. G. Sodini, B. J. Gross, T. P. Ma, and Y. C. Cheng, IEEE Electron Device Lett. EDL-13, 41 (1992).
11. R. Bartnikas, Engineering Dielectrics (Special Technical Publication 926, Philadelphia, 1987).
12. V. Nayar, C. Pickering, and A. M. Hodge, Thin Solid Films 195, 185 (1991).
13. P. Li and T. M. Lu, Appl. Phys. Lett. 59, 1064 (1991).
14. M. Wohlecke, V. Marrello, and A. Onton, J. Appl. Phys. 48, 1748 (1977).