-
1
-
-
0042727039
-
Thermal drift of piezoresistive properties of LPCVD polysilicon thin films between room temperature and 200°C
-
Kleimann P., Semmache B., Le Berre M., Barbier D. Thermal drift of piezoresistive properties of LPCVD polysilicon thin films between room temperature and 200°C. Mater. Sci. Eng. B. 46:1997;43-46.
-
(1997)
Mater. Sci. Eng. B
, vol.46
, pp. 43-46
-
-
Kleimann, P.1
Semmache, B.2
Le Berre, M.3
Barbier, D.4
-
3
-
-
0040082883
-
Stress analysis of elastically anisotropic bilayer structures
-
Huei J.-H., Hsu L. Stress analysis of elastically anisotropic bilayer structures. J.A.P. 69(3):1991;1384-1388.
-
(1991)
J.A.P.
, vol.69
, Issue.3
, pp. 1384-1388
-
-
Huei, J.-H.1
Hsu, L.2
-
4
-
-
0030705286
-
The effect of inorganic thin film material processing and properties on stress in silicon piezoresistive pressure sensor
-
Bitko G., McNeil A.C., Monk D.J. The effect of inorganic thin film material processing and properties on stress in silicon piezoresistive pressure sensor. Mater. Res. Soc. Symp. Proc. 444:1997;221-226.
-
(1997)
Mater. Res. Soc. Symp. Proc.
, vol.444
, pp. 221-226
-
-
Bitko, G.1
McNeil, A.C.2
Monk, D.J.3
-
5
-
-
0041725766
-
Micro-Raman study of thermoelastic stress distribution in oxidized silicon membranes and correlation with finite element modeling
-
Guyot Y., Malhaire C., Le Berre M., Champagnon B., Sibaï A., Bustarret E., Barbier D. Micro-Raman study of thermoelastic stress distribution in oxidized silicon membranes and correlation with finite element modeling. Mater. Sci. Eng. B. 46:1997;24-28.
-
(1997)
Mater. Sci. Eng. B
, vol.46
, pp. 24-28
-
-
Guyot, Y.1
Malhaire, C.2
Le Berre, M.3
Champagnon, B.4
Sibaï, A.5
Bustarret, E.6
Barbier, D.7
-
7
-
-
0020151088
-
Design considerations for silicon circular diaphragm pressure sensors
-
Yasukawa A., Shimada S., Matsuoka Y., Kanda Y. Design considerations for silicon circular diaphragm pressure sensors. J.J.A.P. 21(7):1982;1049-1052.
-
(1982)
J.J.A.P.
, vol.21
, Issue.7
, pp. 1049-1052
-
-
Yasukawa, A.1
Shimada, S.2
Matsuoka, Y.3
Kanda, Y.4
-
8
-
-
0024771422
-
Mechanical property measurements of thin films using load-deflection of composite rectangular membranes
-
Tabata O., Kawahata K., Sugiyama S., Igarashi I. Mechanical property measurements of thin films using load-deflection of composite rectangular membranes. Sensors and Actuators A. 20:1989;135-141.
-
(1989)
Sensors and Actuators a
, vol.20
, pp. 135-141
-
-
Tabata, O.1
Kawahata, K.2
Sugiyama, S.3
Igarashi, I.4
-
9
-
-
0000648361
-
Mise en œuvre de deux méthodes interférométriques pour la caractérisation mécanique des films minces par l'essai de gonflement. Application au cas du silicium monocristallin
-
Bonnotte E., Delobelle P., Bornier L., Trolard B., Tribillon G. Mise en œuvre de deux méthodes interférométriques pour la caractérisation mécanique des films minces par l'essai de gonflement. Application au cas du silicium monocristallin. J. Phys. III France. 5:1995;953-983.
-
(1995)
J. Phys. III France
, vol.5
, pp. 953-983
-
-
Bonnotte, E.1
Delobelle, P.2
Bornier, L.3
Trolard, B.4
Tribillon, G.5
-
10
-
-
0002429638
-
Principles and applications of wafer curvature techniques for stress measurements in thin films
-
Flinn P.A. Principles and applications of wafer curvature techniques for stress measurements in thin films. Mater. Res. Soc. Symp. Proc. 130:1989;41-51.
-
(1989)
Mater. Res. Soc. Symp. Proc.
, vol.130
, pp. 41-51
-
-
Flinn, P.A.1
-
11
-
-
0030676494
-
Micro-Raman study of stress distribution and thermal relaxation of oxidized silicon membranes
-
Malhaire C., Guyot Y., Le Berre M., Champagnon B., Sibaï A., Barbier D. Micro-Raman study of stress distribution and thermal relaxation of oxidized silicon membranes. Mater. Res. Soc. Symp. Proc. 444:1997;179-184.
-
(1997)
Mater. Res. Soc. Symp. Proc.
, vol.444
, pp. 179-184
-
-
Malhaire, C.1
Guyot, Y.2
Le Berre, M.3
Champagnon, B.4
Sibaï, A.5
Barbier, D.6
-
12
-
-
0029225613
-
Influence of the bonding conditions on the response of capacitive pressure sensors
-
Chauffleur X., Blasquez G., Pons P. Influence of the bonding conditions on the response of capacitive pressure sensors. Sensors and Actuators A. 46-47:1995;121-124.
-
(1995)
Sensors and Actuators a
, vol.4647
, pp. 121-124
-
-
Chauffleur, X.1
Blasquez, G.2
Pons, P.3
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