Effect of inorganic thin film material processing and properties on stress in silicon piezoresistive pressure sensors

Materials Research Society Symposium - Proceedings

Volumn 444, Issue , 1997, Pages 221-226

  Bitko, G ^a   McNeil, A C ^a   Monk, D J ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; FILM GROWTH; FINITE ELEMENT METHOD; PASSIVATION; PIEZOELECTRICITY; PLASMA APPLICATIONS; SEMICONDUCTOR DEVICE MANUFACTURE; STRESSES; THICKNESS MEASUREMENT; THIN FILM DEVICES;

SILICON PIEZORESISTIVE PRESSURE SENSORS; STONEY EQUATION; THIN FILM PATTERNING;

SILICON SENSORS;

EID: 0030705286     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)