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Volumn 46, Issue 1-3, 1997, Pages 43-46

Thermal drift of piezoresistive properties of LPCVD polysilicon thin films between room temperature and 200°C

Author keywords

LPCVD polysilicon thin film; Piezoresistance; Thermal drift

Indexed keywords

ANNEALING; BORON; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; ELECTRIC CONDUCTIVITY OF SOLIDS; GRAIN BOUNDARIES; OXIDATION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DOPING; THERMAL EFFECTS;

EID: 0042727039     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01927-7     Document Type: Article
Times cited : (5)

References (19)
  • 10
    • 0042767378 scopus 로고
    • Dr. Ing. Thesis, Technische Universität München
    • E. Obermeier, Dr. Ing. Thesis, Technische Universität München, 1983.
    • (1983)
    • Obermeier, E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.