![]() |
Volumn 46, Issue 1-3, 1997, Pages 43-46
|
Thermal drift of piezoresistive properties of LPCVD polysilicon thin films between room temperature and 200°C
a
|
Author keywords
LPCVD polysilicon thin film; Piezoresistance; Thermal drift
|
Indexed keywords
ANNEALING;
BORON;
CHEMICAL VAPOR DEPOSITION;
COMPOSITION EFFECTS;
ELECTRIC CONDUCTIVITY OF SOLIDS;
GRAIN BOUNDARIES;
OXIDATION;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MODELS;
SEMICONDUCTOR DOPING;
THERMAL EFFECTS;
CLAMPED BEAM TECHNIQUE;
LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);
PIEZORESISTANCE;
THIN FILMS;
|
EID: 0042727039
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-5107(96)01927-7 Document Type: Article |
Times cited : (5)
|
References (19)
|