Micro-Raman study of stress distribution and thermal relaxation of oxidized silicon membranes

Materials Research Society Symposium - Proceedings

Volumn 444, Issue , 1997, Pages 179-184

  Malhaire, C ^a   Guyot, Y ^a   Le Berre, M ^a   Champagnon, B ^a   Sibai, A ^a   Barbier, D ^a  

^a UNIVERSITÉ DE LYON   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE ELEMENT METHOD; MATERIALS TESTING; MEMBRANES; NONDESTRUCTIVE EXAMINATION; RAMAN SPECTROSCOPY; RELAXATION PROCESSES; RESIDUAL STRESSES; SILICA; SILICON; STRESS CONCENTRATION; THERMAL EXPANSION; THERMAL STRESS;

MICRO RAMAN SPECTROSCOPY; OPTICAL PROFILOMETER DEFLECTION MEASUREMENT; OXIDIZED SILICON MEMBRANES; TEMPERATURE DEPENDENT DEFLECTION MEASUREMENT;

COMPOSITE MATERIALS;

EID: 0030676494     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)