Staged Development of Modified Silicon Dioxide Films

Journal of Sol-Gel Science and Technology

Volumn 8, Issue 1-3, 1997, Pages 465-469

  Arkles, Barry ^a   Berry, Donald H ^b   Figge, Lisa K ^b   Composto, Russell J ^b   Chiou, Terry ^b   Colazzo, Hydee ^b   Wallace, William E ^c  

^a Gelest Inc   (United States)

^b UNIVERSITY OF PENNSYLVANIA   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Dielectric films; Silicon dioxide; Spin on glass; Thermal conversion; chloroethylsilsesquioxane; chloroethyltrichlorosilane

Indexed keywords

CHEMICAL BONDS; COMPOSITION EFFECTS; CONDENSATION; ETHYLENE; HYDROLYSIS; MOISTURE; MONOMERS; SILANES; SILICA; SILICON WAFERS;

CHLOROETHYLSILSESQUIOXANE; CHLOROETHYLTRICHLOROSILANE; THERMAL CONVERSION;

DIELECTRIC FILMS;

EID: 0030672844     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02436883     Document Type: Article

References (7)

1. L. Sommer and F. Whitmore, J. Am. Chem. Soc. 68, 485 (1946).
2. L. Sommer, D. Bailey, and F. Whitmore, J. Am. Chem. Soc. 70, 2869 (1948).
3. L. Sommer, G. Goldberg, E. Dorfman, and F. Whitmore, J. Am. Chem. Soc. 68, 1083 (1946).
4. I.M.T. Davidson, C. Eabom, and M.N. Lilly, J. Chem. Soc., 2624 (1964).
5. I.M.T. Davidson, M.R. Jones, and C. Pett, J. Chem. Soc. (b), 938 (1967).
6. C. Agre and W. Hilling, J. Am. Chem. Soc. 74, 3895 (1952).
7. W.E. Wallace and W.L. Wu, Appl. Phys. Lett. 67, 1203 (1995).