Optical nonlinearity in low-temperature-grown GaAs: Microscopic limitations and optimization strategies

Applied Physics Letters

Volumn 74, Issue 21, 1999, Pages 3134-3136

  Haiml, M ^a   Siegner, U ^a   Morier Genoud, F ^a   Keller, U ^a   Luysberg, M ^b   Lutz, R C ^c   Specht, P ^c   Weber, E R ^c  

^a ETH ZURICH   (Switzerland)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c Lawrence Berkeley National Laboratory   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ARSENIC; CRYSTAL DEFECTS; DENSITY MEASUREMENT (OPTICAL); LIGHT ABSORPTION; LIGHT MODULATION; LOW TEMPERATURE PROPERTIES; NONLINEAR OPTICS; OPTICAL CORRELATION;

ARSENIC ANTISITE; CONDUCTION BAND;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0032614512     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124086     Document Type: Article

References (23)

1. H. S. Loka and P. W. E. Smith, IEEE Photonics Technol. Lett. 10, 1733 (1998).
2. U. Keller, K. J. Weingarten, F. X. Kärtner, D. Kopf, B. Braun, I. D. Jung, R. Fluck, C. Hönninger, N. Matuschek, and J. Aus der Au, IEEE J. Sel. Top. Quantum Electron. 2, 435 (1996).
3. R. Takahashi, Y. Kawamura, and H. Iwamura, Appl. Phys. Lett. 68, 153 (1996).
4. S. Gupta, M. Y. Frankel, J. A. Valdmanis, J. F. Whitaker, G. A. Mourou, F. W. Smith, and A. R. Calawa, Appl. Phys. Lett. 59, 3276 (1991).
5. G. D. Witt, Mater. Sci. Eng., B 22, 9 (1993).
6. A. J. Lochtefeld, M. R. Melloch, J. C. P. Chang, and E. S. Harmon, Appl. Phys. Lett. 69, 1465 (1996).
7. U. Siegner, R. Fluck, G. Zhang, and U. Keller, Appl. Phys. Lett. 69, 2566 (1996).
8. H. S. Loka, S. D. Benjamin, and P. W. E. Smith, IEEE J. Quantum Electron. 34, 1426 (1998).
9. M. Haiml, U. Siegner, F. Morier-Genoud, U. Keller, M. Luysberg, P. Specht, and E. R. Weber, Appl. Phys. Lett. 74, 1269 (1999).
10. X. Liu, A. Prasad, W. M. Chen, A. Kurpiewski, A. Stoschek, Z. Liliental-Weber, and E. R. Weber, Appl. Phys. Lett. 65, 3002 (1994).
11. Y. H. Lee, A. Chavez-Pirson, S. W. Koch, H. M. Gibbs, S. H. Park, J. Morhange, A. Jeffery, N. Peyghambarian, L. Banyai, A. C. Gossard, and W. Wiegmann, Phys. Rev. Lett. 57, 2446 (1986).
12. J. U. Kang, M. Y. Frankel, J.-W. Huang, and T. F. Kuech, Appl. Phys. Lett. 70, 1560 (1997).
13. G. P. Agrawal and N. A. Olsson, IEEE J. Quantum Electron. 25, 2297 (1989).
14. L. R. Brovelli, U. Keller, and T. H. Chiu, J. Opt. Soc. Am. B 12, 311 (1995).
15. S. U. Dankowski, D. Streb, M. Ruff, P. Kiesel, M. Kneissl, B. Knüpfer, G. H. Döhler, U. D. Keil, C. B. Sørenson, and A. K. Verma, Appl. Phys. Lett. 68, 37 (1996).
16. K. Khachaturyan, E. R. Weber, and J. Horigan, Phys. Rev. B 46, 1365 (1992).
17. P. Silverberg, P. Omling, and L. Samuelson. Appl. Phys. Lett. 52, 1689 (1988).
18. P. Omling, P. Silverberg, and L. Samuelson, Phys. Rev. B 38, 3606 (1988).
19. A. L. Smirl, G. C. Valley, K. M. Bohnert, and T. F. Boggess, IEEE J. Quantum Electron. 24, 289 (1988).
20. M. R. Melloch, N. Otsuka, J. M. Woodall, A. C. Warren, and J. L. Free-ouf, Appl. Phys. Lett. 57, 1531 (1990).
21. D. D. Nolte, J. Appl. Phys. 76, 3740 (1994).
22. D. T. McInturff, J. M. Woodall, A. C. Warren, N. Braslau, G. D. Pettit, P. D. Kirchner, and M. R. Melloch, Appl. Phys. Lett. 60, 448 (1992).
23. Z. Liliental-Weber, J. Ager, D. Look, X. W. Lin, X. Liu, J. Nishio, K. Nichols, W. Schaff, W. Swider, K. Wang, J. Wasburn, E. R. Weber, and J. Whitaker, in Proceedings of the Eighth Conference on Semi-insulating III-V Materials, edited by M. Godlewski (World Scientific, Singapore, 1994), p. 305.