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Volumn 75, Issue 10, 1999, Pages 1416-1418
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Annealing behavior of p-type Ga0.892In0.108NxAs1-x (0≤X≤0.024) grown by gas-source molecular beam epitaxy
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Author keywords
[No Author keywords available]
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Indexed keywords
BERYLLIUM;
CARRIER CONCENTRATION;
HALL EFFECT;
MOLECULAR BEAM EPITAXY;
PHOTOLUMINESCENCE;
QUANTUM EFFICIENCY;
RAPID THERMAL ANNEALING;
SECONDARY ION MASS SPECTROMETRY;
SEMICONDUCTOR DOPING;
SEMICONDUCTOR GROWTH;
SOLAR CELLS;
SUBSTRATES;
GAS-SOURCE MOLECULAR BEAM EPITAXY (MBE);
HIGH-RESOLUTION X RAY ROCKING CURVES (XRC);
SEMICONDUCTING GALLIUM COMPOUNDS;
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EID: 0032606207
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.124711 Document Type: Article |
Times cited : (77)
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References (12)
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