Laser focused atomic deposition: A new lithography tool

Applied Physics Letters

Volumn 68, Issue 8, 1996, Pages 1034-1036

  Behringer, R E ^a   Natarajan, Vasant ^a   Timp, G ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC BEAMS; CALCULATIONS; DIFFRACTION GRATINGS; DYE LASERS; ELECTRON ENERGY LEVELS; FOCUSING; GEOMETRICAL OPTICS; LASER APPLICATIONS; RESONANCE; SCANNING TUNNELING MICROSCOPY; SODIUM; VACUUM;

DETUNINGS; GRATING STRUCTURE; LASER FOCUSED ATOMIC DEPOSITION; LINEWIDTH; OPTICAL STANDING WAVE;

LITHOGRAPHY;

EID: 0030082157     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116239     Document Type: Article

References (11)

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