Assembly of extreme ultraviolet lithography optics using at-wavelength foucault testing

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers

Volumn 35, Issue 12 B, 1996, Pages 6347-6695

  Haga, Tsuneyuki ^a   Tinone, Marcia C K ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; IMAGING TECHNIQUES; OPTICAL TRANSFER FUNCTION; OPTICS; PERFORMANCE; WAVEFRONTS;

ABERRATION; ASPHERICAL MIRROR OPTICS; ASSEMBLY ERROR; DIFFRACTION LIMITED RESOLUTION; EXTREME ULTRAVIOLET LITHOGRAPHY; FOUCAULT GRAIN; FOUCAULT TESTING; RAY TRACING; WAVE FRONT ERROR;

LITHOGRAPHY;

EID: 0030378212     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Review

References (12)