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Volumn 3286, Issue , 1998, Pages 18-29

Ultralow threshold 850-nm oxide-apertured vertical cavity lasers using AlInGaAs/AlGaAs strained active layers

Author keywords

Oxide aperture; Rapid thermal annealing; Strained active layer; Vertical cavity lasers

Indexed keywords

CURRENT DENSITY; DEGRADATION; RAPID THERMAL ANNEALING; SEMICONDUCTOR QUANTUM WELLS;

EID: 0032224211     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.305463     Document Type: Conference Paper
Times cited : (2)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.