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Volumn 3286, Issue , 1998, Pages 18-29
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Ultralow threshold 850-nm oxide-apertured vertical cavity lasers using AlInGaAs/AlGaAs strained active layers
a a a a a |
Author keywords
Oxide aperture; Rapid thermal annealing; Strained active layer; Vertical cavity lasers
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Indexed keywords
CURRENT DENSITY;
DEGRADATION;
RAPID THERMAL ANNEALING;
SEMICONDUCTOR QUANTUM WELLS;
STRAINED ACTIVE ALYERS;
LASERS;
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EID: 0032224211
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.305463 Document Type: Conference Paper |
Times cited : (2)
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References (20)
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