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Volumn 7, Issue 4, 1998, Pages 572-580

Study of the plasma pre-sheath in magnetron discharges dominated by Bohm diffusion of electrons

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ELECTRIC DISCHARGES; ELECTRONS; MAGNETRONS; PLASMA DENSITY; PLASMA SIMULATION;

EID: 0032204645     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/7/4/014     Document Type: Article
Times cited : (24)

References (24)
  • 2
    • 11744265434 scopus 로고
    • ed J L Vossen and W Kern (New York: Academic)
    • Waits R K 1978 Thin Film Processes ed J L Vossen and W Kern (New York: Academic) p 31
    • (1978) Thin Film Processes , pp. 31
    • Waits, R.K.1
  • 18


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.