Deflection and maximum load of microfiltration membrane sieves made with silicon micromachining

Journal of Microelectromechanical Systems

Volumn 6, Issue 1, 1997, Pages 48-54

  Van Rijn, Cees ^a,b,c,d,e   Van Der Wekken, Michiel ^a,f   Nijdam, Wietze ^a,e,g   Elwenspoek, Miko ^a,g,h,i,j,k  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b VU UNIVERSITY AMSTERDAM   (Netherlands)

^c LEIDEN UNIVERSITY   (Netherlands)

^d PHILIPS RESEARCH LABORATORIES   (Netherlands)

^e AQUAMARIJN MICRO FILTRATION B V   (Netherlands)

^f HAN UNIVERSITY OF APPLIED SCIENCES   (Netherlands)

^g UNIVERSITY OF TWENTE   (Netherlands)

^h FREIE UNIVERSITÄT BERLIN   (Germany)

ⁱ RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

^j Faculty of Electrical Engineering

^k Jnl Microelectromechanical Syst S ^*

more..

Author keywords

Filtration membranes; Membrane deflection; Membrane filtration; Membrane strength; Micro filtration

Indexed keywords

APPROXIMATION THEORY; CHEMICAL VAPOR DEPOSITION; FILTRATION; LOADS (FORCES); MEMBRANES; MICROMACHINING; REACTIVE ION ETCHING; SIEVES; SILICON NITRIDE; SILICON WAFERS; STRENGTH OF MATERIALS; THIN FILMS;

INORGANIC MEMBRANES; MEMBRANE DEFLECTION; MEMBRANE STRENGTH; MICROFILTRATION MEMBRANE SIEVES; SILICON MICROMACHINING; SILICON NITRIDE MEMBRANES;

MICROELECTROMECHANICAL DEVICES;

EID: 0031098187     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.557530     Document Type: Article

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