Influence of the surface treatment of the substrate in the LCVD of CNx films

Surface and Coatings Technology

Volumn 100-101, Issue 1-3, 1998, Pages 173-179

  Crunteanu, A ^a   Cireasa, R ^a   Alexandrescu, R ^a   Morjan, I ^a   Nelea, V ^a   Mihailescu, I N ^a   Andrei, A ^b   Vasiliu, F ^c  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b INSTITUTE FOR NUCLEAR RESEARCH   (Romania)

^c NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

Author keywords

CNx films; LCVD; Surface treatment

Indexed keywords

CHEMICAL MODIFICATION; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; CRYSTAL STRUCTURE; FILM GROWTH; LASER APPLICATIONS; MORPHOLOGY; NUCLEATION; SUBSTRATES; SURFACE STRUCTURE; SURFACE TREATMENT; THIN FILMS;

CARBON NITRIDE; LASER INDUCED CHEMICAL VAPOR DEPOSITION (LCVD);

NITRIDES;

EID: 0032023243     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00610-5     Document Type: Article

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