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Volumn 44, Issue 12, 1997, Pages 2309-2311

Close correspondence between forward gated-diode and charge pumping currents observed in hot-carrier stressed PMOSFET's

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; GATES (TRANSISTOR); HOT CARRIERS; SEMICONDUCTOR DIODES;

EID: 0031336441     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.644662     Document Type: Article
Times cited : (1)

References (10)
  • 2
    • 0024612061 scopus 로고    scopus 로고
    • Hot-carrier degradation of n-channel MOSFET's characterized by a gated-diode measurement technique
    • T. Giebel and K. Goser Hot-carrier degradation of n-channel MOSFET's characterized by a gated-diode measurement technique IEEE Electron Device Lett. vol. 10 pp. 76-78 1989.
    • IEEE Electron Device Lett. Vol. 10 Pp. 76-78 1989.
    • Giebel, T.1    Goser, K.2
  • 7
    • 0030125770 scopus 로고    scopus 로고
    • Comparison of gate-induced drain leakage and charge pumping measurements for determining lateral interface trap profiles in electrically stressed MOSFET's
    • S. Okhonin T. Hessler and M. Dutoit Comparison of gate-induced drain leakage and charge pumping measurements for determining lateral interface trap profiles in electrically stressed MOSFET's IEEE Trans. Electron Devices vol. 43 pp. 605-611 1996.
    • IEEE Trans. Electron Devices Vol. 43 Pp. 605-611 1996.
    • Okhonin, S.1    Hessler, T.2    Dutoit, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.