The role of the substrate on pattern-dependent charging

Journal of the Electrochemical Society

Volumn 144, Issue 12, 1997, Pages

  Hwang, Gyeong S ^a   Giapis, Konstantinos P ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC CURRENTS; ELECTRONS; MONTE CARLO METHODS; PLASMA ETCHING; SILICON WAFERS; SUBSTRATES;

ELECTRON SHADING EFFECT; NET POSITIVE CURRENT;

ELECTRIC CHARGE;

EID: 0031333352     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838146     Document Type: Article

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