Ultrafast metal-semiconductor-metal photoconductive switches fabricated using an atomic force microscope

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 2 SUPPL. B, 1996, Pages 1387-1389

  Itatani, Taro ^a   Segawa, Kazuhito ^a   Matsumoto, Kazuhiko ^a   Ishii, Masami ^a   Nakagawa, Tadashi ^a   Ohta, Kimihiro ^a   Sugiyama, Yoshinobu ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

Atomic force microscope; Electrooptic sampling; Femtosecond; Photoconductive switch; Titanium oxide; Ultrafast

Indexed keywords

ATOMIC FORCE MICROSCOPY; OXIDATION; PHOTOCONDUCTING DEVICES; PHOTOCONDUCTIVITY; SEMICONDUCTOR DEVICE MANUFACTURE; THIN FILMS; TITANIUM OXIDES; ULTRAFAST PHENOMENA;

ELECTROOPTIC SAMPLING; FEMTOSECOND; PHOTOCONDUCTIVE GAP; PHOTOCONDUCTIVE SWITCH;

SEMICONDUCTOR SWITCHES;

EID: 0030080398     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.1387     Document Type: Article

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