Problems of sacrificial etching in the presence of aluminium interconnect

Sensors and Actuators, A: Physical

Volumn 62, Issue 1-3, 1997, Pages 692-697

  Goosen, Johannes F L ^a   Van Drieënhuizen, Bert P ^a   French, Patrick J ^a,b   Wolffenbuttel, Reinoud F ^a,c  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b NISSAN MOTOR CO   (Japan)

^c UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Aluminium interconnects; Sacrificial etching; Surface micromachining

Indexed keywords

ADHESION; ETCHING; GLYCEROL; HYDROFLUORIC ACID; MICROMACHINING; PEELING; PHOTORESISTS;

ALUMINUM INTERCONNECTS; BUFFERED HYDROFLUORIC ACID (BHF);

MICROELECTRONIC PROCESSING;

EID: 0031175888     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)01562-8     Document Type: Article

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