Integration of surface micromachined polysilicon mirrors and a standard CMOS process

International Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Proceedings

Volumn 1, Issue , 1995, Pages 305-307

  Fischer, M ^a   Naegele, M ^a   Eichner, D ^a   Schoellhorn, C ^a   Strobel, R ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CMOS INTEGRATED CIRCUITS; ELECTROSTATICS; INTEGRATED CIRCUIT MANUFACTURE; ION IMPLANTATION; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MIRRORS; OXIDATION; SEMICONDUCTOR DOPING; SEMICONDUCTOR QUANTUM WELLS; SILICON WAFERS;

ALUMINIUM GATES; ALUMINIUM METALLIZATION; CMOS PROCESS; COUNTER ELECTRODE; DEMULTIPLEXER CIRCUITS; DOPING CONCENTRATION; LIGHT DEFLECTION; POLYSILICON MIRRORS; SURFACE MICROMACHINING;

MICROELECTRONIC PROCESSING;

EID: 0029493115     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)