Molecular dynamics simulation of electromigration in nano-sized metal lines

Materials Transactions, JIM

Volumn 37, Issue 3, 1996, Pages 454-457

  Ohkubo, Tadakatsu ^a   Hirotsu, Yoshihiko ^a   Nikawa, Kiyoshi ^b  

^a OSAKA UNIVERSITY   (Japan)

^b NEC CORPORATION   (Japan)

Author keywords

Diffusion; Drift velocity; Electric Geld; Electromigration; Metalline; Molecular dynamics simulation

Indexed keywords

BOUNDARY CONDITIONS; COMPUTER SIMULATION; CRYSTAL ATOMIC STRUCTURE; CURRENT DENSITY; DIFFUSION IN SOLIDS; LAPLACE TRANSFORMS; MATHEMATICAL MODELS; MOLECULAR DYNAMICS; SINGLE CRYSTALS;

DRIFT VELOCITY; LENNARD JONES SINGLE CRYSTAL STRUCTURE; METAL LINES;

ELECTROMIGRATION;

EID: 0030108604     PISSN: 09161821     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans1989.37.454     Document Type: Article

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