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Volumn 75, Issue 12, 1994, Pages 7799-7804

Computer simulation of electromigration in thin-film metal conductors

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0008457212     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.356586     Document Type: Article
Times cited : (27)

References (32)
  • 11
    • 0019660825 scopus 로고    scopus 로고
    • in Proceedings of the 19th IEEE International Reliability Physics Symposium (IRPS), 1981
    • Nikawa, K.1
  • 14
    • 0022566257 scopus 로고    scopus 로고
    • in Proceedings of the IEEE VLSI Multilevel Interconnection Conference (V-MIC), 1986
    • Walter, M.J.1
  • 23
    • 84951897902 scopus 로고    scopus 로고
    • Ph.D. thesis, University of Newcastle upon Tyne, 1993
    • Trattles, J.T.1
  • 28
    • 0023855692 scopus 로고    scopus 로고
    • in Proceedings of the 26th IEEE International Reliability Physics Symposium (IRPS), 1988
    • Maiz, J.A.1    Segura, I.2
  • 30
    • 84951891576 scopus 로고    scopus 로고
    • Material Research Society Symposium Proceedings:Materials Reliability Issues in Microelectronics
    • (MRS, Pittsburgh, PA, 1991), C.-K. Hu, P. S. Ho, M. B. Small, and K. Kelleher, in
    • , vol.225 , pp. 99-105


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.