Transmission electron microscopy study of defect structure in epitaxial SnO2 rutile thin film

Journal of the Ceramic Society of Japan

Volumn 110, Issue 1278, 2002, Pages 86-91

  Suzuki, Toshimasa ^a   Wakabayashi, Hirotaka ^a   Nishi, Yuji ^a   Fujimoto, Masayuki ^a  

^a TAIYO YUDEN CO LTD   (Japan)

Author keywords

Crystallographic shear structure; Heteroepitaxy; Misfit dislocation; Rutile

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; DISLOCATIONS (CRYSTALS); EPITAXIAL GROWTH; INTERFACIAL ENERGY; RELAXATION PROCESSES; STACKING FAULTS; THIN FILMS;

CRYSTALLOGRAPHY SHEAR STRUCTURE; HETEROEPITAXY; MISFIT LOCATION; RUTILE THIN FILMS; SNO2;

TIN COMPOUNDS;

EID: 0012754793     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.110.86     Document Type: Article

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