Characterization of silicon wafers through deposition of self-assembled monolayers

Fresenius' Journal of Analytical Chemistry

Volumn 368, Issue 5, 2000, Pages 434-438

  Basnar, B ^a   Schnoller J ^a   Fottinger K ^a   Friedbacher, G ^a   Mayer, U ^a   Hoffmann, H ^a   Fabry, L ^b  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b SILTRONIC AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012079713     PISSN: 09370633     EISSN: None     Source Type: Journal    
DOI: 10.1007/s002160000564     Document Type: Article

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