Two-dimensional dopant profiling of patterned Si wafers using phase imaging tapping mode atomic force microscopy with applied biases

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 4, 1999, Pages 1354-1360

  Nelson, M W ^a  

^a Department of Environmental and Radiological Health Sciences   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644450171     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590760     Document Type: Article

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