Vacuum ultraviolet to visible emission from hydrogen plasma: Effect of excitation frequency

Journal of Applied Physics

Volumn 88, Issue 1, 2000, Pages 20-33

  Fozza, A C ^a   Moisan, M ^b   Wertheimer, M R ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^b UNIVERSITÉ DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011856395     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.373618     Document Type: Article

References (85)

1. Plasma Etching - An Introduction, edited by D. M. Manos and D. L. Flamm (Academic, Boston, 1989).
2. Handbook of Plasma Processing Technology, edited by S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood (Noyes, Park Ridge, 1990).
3. Plasma Processing of Polymers, edited by R. d'Agostino, P. Favia, and F. Fracassi, NATO-ASI Series E: Applied Science, Vol. 346 (Kluwer Academic, Dordrecht, 1997).
4. A. C. Fozza, A. Kruse, A. Holländer, A. Ricard, and M. R. Wertheimer, J. Vac. Sci. Technol. A 16, 72 (1998).
5. V. M. Donnelly, D. L. Flamm, and R. H. Bruce, J. Appl. Phys. 58, 2135 (1985).
6. D. L. Flamm and V. M. Donnelly, J. Appl. Phys. 59, 1052 (1986).
7. K. Köhler, D. E. Horne, and J. W. Coburn, J. Appl. Phys. 58, 3350 (1985).
8. S. Kakuta, T. Makabe, and F. Tochikubo, J. Appl. Phys. 74, 4907 (1993).
9. S. Oda, J. Noda, and M. Matsumura, Jpn. J. Appl. Phys., Part 1 29, 1889 (1990).
10. F. Finger, U. Kroll, V. Viret, A. Shah, W. Berger, X.-M. Tang, J. Weber, A. Howling, and Ch. Hollenstein, J. Appl. Phys. 71, 5665 (1992).
11. F. Finger, P. Hapke, M. Luysberg, R. Carius, H. Wagner, and M. Scheib, Appl. Phys. Lett. 65, 2588 (1994).
12. T. Tzolov, F. Finger, R. Carius, and P. Hapke, J. Appl. Phys. 81, 7376 (1997).
13. M. V. Malyshev, V. M. Donnelly, and S. Samukawa, J. Appl. Phys. 84, 1222 (1998).
14. T. Kitajima, Y. Takeo, N. Nakano, and T. Makabe, J. Appl. Phys. 84, 5928 (1998).
15. Microwave Excited Plasmas, edited by M. Moisan and J. Pelletier (Elsevier, Amsterdam, 1992).
16. Microwave Discharges: Fundamentals and Applications, edited by C. M. Ferreira and M. Moisan, NATO-ASI Series B: Physics, Vol. 302 (Plenum, New York, 1993).
17. M. Moisan, C. M. Ferreira, J. Hubert, J. Margot, and Z. Zakrzewski, AIP Conf. Proc. 363, 25 (1995).
18. M. R. Wertheimer, L. Martinu, and M. Moisan, in Ref. 3, p. 101.
19. M. Moisan and Z. Zakrzewski, in Ref. 15, Chap. 5.
20. J. Margot-Chaker, M. Moisan, M. Chaker, V. M. M. Glaude, P. Lauque, J. Paraszczak, and G. Sauvé, J. Appl. Phys. 66, 4134 (1989).
21. R. Claude, M. Moisan, M. R. Wertheimer, and Z. Zakrzewski, Plasma Chem. Plasma Process. 7, 451 (1987).
22. M. Moisan, C. Barbeau, R. Claude, C. M. Ferreira, J. Margot, J. Paraszczak, A. B. Sá, G. Sauvé, and M. R. Wertheimer, J. Vac. Sci. Technol. B 9, 8 (1991).
23. C. M. Ferreira and M. Moisan, in Ref. 15, Chap. 3.
24. S. Oda, Plasma Sources Sci. Technol. 2, 26 (1993).
25. M. Moisan, R. Pantel, A. Ricard, V. M. M. Glaude, P. Leprince, and W. P. Allis, Rev. Phys. Appl. 15, 1383 (1980).
26. J. Margot, M. Moisan, and A. Ricard, Appl. Spectrosc. 45, 260 (1991).
27. L. St-Onge, Mémoire M.Sc., Université de Montréal, 1992.
28. L. St-Onge and M. Moisan, Plasma Chem. Plasma Process. 14, 87 (1994).
29. C. Beneking and P. Anderer, J. Phys. D: Appl. Phys. 25, 1470 (1992).
30. W. Schwarzenbach, A. A. Howling, M. Fivaz, S. Brunner, and Ch. Hollenstein, J. Vac. Sci. Technol. A 14, 132 (1996).
31. Z. Zakrzewski and M. Moisan, Plasma Sources Sci. Technol. 4, 379 (1995).
32. R. Winkler, J. Wilhelm, and A. Hess, Ann. Physik 42, 537 (1985).
33. R. Winkler in Ref. 16, p. 339.
34. G. L. Braglia, G. L. Ricci, J. Wilhelm, and R. Winkler, Nuovo Cimento D 13, 1235 (1991).
35. H.-D. Voigt, J. Wilhelm, and R. Winkler, Contrib. Plasma Phys. 31, 309 (1991).
36. K. Maeda and T. Makabe, Phys. Scr., T T53, 61 (1994).
37. N. Goto and T. Makabe, J. Phys. D: Appl. Phys. 23, 686 (1990).
38. P. A. Sá, J. Loureiro, and C. M. Ferreira, J. Phys. D: Appl. Phys. 25, 960 (1992).
39. P. A. Sá, J. Loureiro, and C. M. Ferreira, J. Phys. D: Appl. Phys. 27, 1171 (1994).
40. J. Loureiro, Phys. Rev. E 47, 1262 (1993).
41. M. Dilonardo, M. Capitelli, and C. Gorse, Contrib. Plasma Phys. 28, 543 (1988).
42. M. Capitelli, C. Gorse, and S. Longo in Ref. 16, p. 379.
43. C. M. Ferreira, J. Phys. D: Appl. Phys. 14, 1811 (1981).
44. L. S. Frost and A. V. Phelps, Phys. Rev. 136, A1538 (1964).
45. A. Mozumder, J. Chem. Phys. 72, 1657 (1980).
46. A. Mozumder, J. Chem. Phys. 72, 6289 (1980).
47. m(u) being almost constant over the relevant interval in the latter case).
48. S. C. Brown, Basic Data of Plasma Physics (Technol Press MIT and Wiley, New York, 1959), p. 17.
49. J. Rogers and J. Asmussen, IEEE Trans. Plasma Sci. PS10, 11 (1982).
50. Z. Rakem, P. Leprince, and J. Marec, Rev. Phys. Appl. 25, 125 (1990).
51. R. W. B. Pearse and A. G. Gaydon, The Identification of Molecular Spectra (Chapman and Hall, New York, 1976).
52. J. M. Ajello, S. K. Srivastava, and Y. L. Yung, Phys. Rev. A 25, 2485 (1982).
53. G. Herzberg, Molecular Spectra and Molecular Structure: 1. Spectra of Diatomic Molecules (Van Nostrand, Princeton N.J., 1950).
54. M. Capitelli and E. Molinari, Top. Curr. Chem. 90, 59 (1980).
55. A. Rousseau, A. Granier, G. Gousset, and P. Leprince, J. Phys. D: Appl. Phys. 27, 1412 (1994).
56. L. Thomas, J. L. Jauberteau, I. Jauberteau, J. Aubreton, and A. Catherinot, Plasma Chem. Plasma Process. 17, 193 (1997).
57. A. von Engel, Ionized Gases (Oxford University Press, London, 1965).
58. W. L. Wise, M. W. Smith, and B. W. Glennon, "Atomic transition probabilities II," National Bureau of Standards Publication No. NSRDS-BS 22 (1969).
59. T. Kokubo, F. Tochikubo, and T. Makabe, J. Phys. D: Appl. Phys. 22, 1281 (1989).
60. C. Karolis and E. Harting, J. Phys. B 11, 357 (1978).
61. P. Pianarosa, J. M. Gagné, G. Larin, and J. P. Saint-Dizier, J. Opt. Soc. Am. Lett. 72, 392 (1982).
62. V. Schulz-von der Gathen and H. F. Döbele, Plasma Chem. Plasma Process. 16, 461 (1996).
63. K. Kurihara, K. Sasaki, and M. Kawarda, Fujitsu Sci. Tech. J. 25, 44 (1989).
64. A. Rousseau, E. Bluem, A. Granier, P. Leprince, and J. Marec, Proceeding Escampig 92, St. Petersburg, Russia, August 25-28, 1992 (European Physical Society, 1992), p. 97.
65. A. Rousseau, E. Bluem, A. Granier, C. Boisse-Laporte, G. Gousset, and P. Leprince, Proceedings 11th International Symposium on Plasma Chemistry (ISPC), Loughborough, UK (IUPAC), 1993, p. 234.
66. R. L. Long, Jr., D. M. Cox, and S. J. Smith, J. Res. Natl. Bur. Stand., Sect. A 72A, 521 (1968).
67. M. J. Mumma and E. C. Zipf, J. Chem. Phys. 55, 1661 (1971).
68. A. V. Phelps et al., JILA Home Page, JILA, University of Colorado Boulder and NIST, http://jilawww.colorado.edu/www/research/colldata.html.
69. J. M. Ajello, D. E. Shemansky, and G. K. James, Astrophys. J. 371, 422 (1991).
70. A. Granier, C. Boisse-Laporte, P. Leprince, J. Marek, and P. Nghiem, J. Phys. D: Appl. Phys. 20, 204 (1989).
71. M. Chaker and M. Moisan, J. Appl. Phys. 57, 91 (1985).
72. M. Chaker, M. Moisan, and Z. Zakrzewski, Plasma Chem. Plasma Process. 6, 79 (1986).
73. J. D. Walker and R. M. St. John, J. Chem. Phys. 61, 2394 (1974).
74. J. P. Boeuf, L. C. Pitchford, and Kinema Research & Software, "The Siglo Data Base," CPAT (Toulouse) and Kinema Software, http://www.sni.net/siglo/
75. B. P. Lavrov, Opt. Spectrosc. 42, 251 (1977).
76. B. P. Lavrov, A. S. Melnikov, M. Käning, and J. Röpcke, Phys. Rev. E 59, 3526 (1999).
77. M. Moisan and A. Ricard, Can. J. Phys. 55, 1010 (1977).
78. B. Ceccaroli and A. Ricard, Rev. Phys. Appl. 21, 197 (1986).
79. J. I. McOmber, J. T. Davies, J. C. Howden, and E. M. Liston, Proceedings 9th International Plasma Processing Symposium (The Electrochemical Society, New York, 1992), p. 104.
80. E. M. Liston, Proceedings International Symposium on Plasma Chemistry-ISPC 7, Eindhoven, The Netherlands, July 1985, paper number P-10-8.
81. A. C. Fozza, J. Roch, J. E. Klemberg-Sapieha, A. Kruse, A. Holländer, and M. R. Wertheimer, Nucl. Instrum. Methods Phys. Res. B 131, 205 (1997).
82. A. Holländer, J. E. Klemberg-Sapieha, and M. R. Wertheimer, J. Polym. Sci., Part A: Polym. Chem. 33, 2073 (1995).
83. M. R. Wertheimer, A. C. Fozza, and A. Holländer, Nucl. Instrum. Methods Phys. Res. B 151, 65 (1999).
84. A. P. Motornenko and P. Tulnin, Opt. Spektrosk. 8, 586 (1964).
85. A. P. Motornenko, Opt. Spektrosk. 9, 1078 (1965).