Preparation and characterization of Pb(Nb,Ti)O3 thin films by metalorganic chemical vapor deposition

Journal of Applied Physics

Volumn 86, Issue 8, 1999, Pages 4559-4564

  Matsuzaki, Tomokazu ^a   Funakubo, Hiroshi ^a  

^a Tokyo Institute of Technology ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001149401     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371403     Document Type: Article

References (16)

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