A Method of Making Oxynitrides by Interface Nitridation Through Silicon

Journal of the Electrochemical Society

Volumn 148, Issue 4, 2001, Pages

  Suizu, Yasumasa ^a   Fukumoto, Masato ^a   Ozawa, Yoshio ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008000147     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1353578     Document Type: Article

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