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Volumn 148, Issue 12, 2001, Pages

In Situ Rapid Thermal Oxidation and Reduction of Copper Thin Films and Their Applications in Ultralarge Scale Integration

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0005383340     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1413480     Document Type: Article
Times cited : (35)

References (23)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.