Novel bilayer bottom antireflective coating structure for high-performance ArF lithography applications

Journal of Microlithography, Microfabrication and Microsystems

Volumn 1, Issue 1, 2002, Pages 58-62

  Chen, H L ^a   Chao, W C ^b   Ko, F H ^a   Chu, T C ^b   Huang, T Y ^a  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

ArF lithography; Bi layer bottom antireflective coating; Deep ultraviolet resist

Indexed keywords

EID: 0005306540     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1447947     Document Type: Article

References (10)

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