Evaluation of metal migration and determination of trace metals after microwave digestion for lithographic materials

Analytical Chemistry

Volumn 71, Issue 23, 1999, Pages 5413-5419

  Ko, Fu Hsiang ^a   Wang, Mei Ya ^a   Wang, Tien Ko ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

CESIUM; SOLVENT; WATER; ZINC;

ACCURACY; ANALYTIC METHOD; ARTICLE; CHEMICAL ANALYSIS; DIFFUSION; EVAPORATION; HEATING; MICROWAVE RADIATION; REACTION ANALYSIS; TEMPERATURE SENSITIVITY; VALIDATION PROCESS;

EID: 0033485348     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac9906779     Document Type: Article

References (23)

1. Sze, S. M. VLSI Technology, McGraw-Hill: New York, 1988; Chapter 14.
2. Chang, C. Y.; Sze, S. M. ULSI Technology; McGraw-Hill: New York, 1996; Chapter 12.
3. Ward, P. J. J. Electrochem. Soc. 1982, 129, 2573-2575.
4. Miyazaki, M.; Sano, M.; Sumita, S.; Fujino, N. Jpn. J. Appl. Phys. 1991, 30, L295-L297.
5. Rotondaro, A. L. P.; Hurd, T. Q.; Kaniava, A.; Vanhellemont, J.; Simoen, E.; Heyns, M. M.; Claeys, C. J. Electrochem. Soc. 1996, 143, 3014-3019.
6. The National Technology Roadmap for Semiconductors; Semiconductor Industry Assoc., San Jose, CA. 1997; p 93.
7. Crighton, J. S.; Carroll, J.; Fairman, B.; Haines, J.; Hinds, M. J. Anal. At. Spectrom. 1997, 12, 509R-542R.
8. Fuchs-Pohl, G. R.; Solinska, K.; Feig, H. Fresenius J. Anal. Chem. 1992, 343, 711-714.
9. Argentine, M. D.; Barnes, R. M. J. Anal. At. Spectrom. 1994, 9, 1371-1378.
10. Shabani, M. B.; Yoshihiro, T.; Abe, H. J. Electrochem. Soc. 1996, 143, 2025-2029.
11. Dowsett, M. G.; Barlow, R. D.; Allen, P. N. J. Vac. Sci. Technol. 1994, B12, 186-198.
12. Borg, R. J.; Dienes, G. J. An Introduction to Solid State Diffusion; Academic Press: Boston, 1988; Chapter 11.
13. Glekas, I. P. Water Sci. Technol. 1995, 32, 179-187.
14. Choppin, G. R.; Rydberg, J. Nuclear Chemistry, Pergamon Press: Oxford. U.K., 1980; Chapter 18.
15. Takenaka, M.; Kozuka, S.; Hashimoto, Y. Bunseki Kagaku 1993, 42, T71-T75.
16. Kingston, H. M. At. Spectrosc. 1998, 19, 27-30.
17. Ko, F.-H.; Yang, M.-H. J. Anal. At. Spectrom. 1996, 11, 413-420.
18. Thompson, L. F.; Wilson, C. G.; Bowden, M. J. Introduction to Microlithography, 2nd ed.; American Chemical Society: Washington, DC, 1994; Chapter 4.
19. Bencher, C.; Ngai, C.; Roman, B.; Lian, S.; Vuong, T. Solid State Technol. 1997, (Mar) 109-114.
20. Tanaka, T.; Hasegawa, N.; Shiraishi, H.; Okazaki, S. J. Electrochem. Soc. 1990, 137, 3900-3904.
21. Wang, M.-Y.; Ko, F.-H.; Wang, T.-K.; Yang, C.-C.; Huang, T.-Y. J. Electrochem. Soc. 1999, 146, 3455-3460.
22. Crank, J. The Mathematics of Diffusion; Oxford Univ. Press: London, 1976; Chapter 3.
23. Ko, F.-H.; Hsiao, L.-T.; Chou, C.-T.; Wang, M.-Y.; Wang, T.-K.; Sun, Y.-C.; Cheng, B.-J.; Yeng, S.; Dai, B.-T. Proc. SPIE 1999, V3677, 907-917.