Generation of subquarter-micron resist structures using optical interference lithography and image reversal

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 1949-1953

  Decker, J Y ^a   Fernandez, A ^a   Sweeney, D W ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; ASPECT RATIO; DIFFRACTION GRATINGS; FABRICATION; IMAGING TECHNIQUES; LASER APPLICATIONS; PHOTOLITHOGRAPHY; PHOTORESISTS;

IMAGE REVERSAL TECHNIQUES; INTERFERENCE LITHOGRAPHY;

SEMICONDUCTOR DEVICE STRUCTURES;

EID: 0031273483     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589583     Document Type: Article

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