Fabrication of sub-0.5 μm diameter cobalt dots on silicon substrates and photoresist pedestals on 50 cm×50 cm glass substrates using laser interference lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 3, 1996, Pages 2005-2007

  Spallas, J P ^a   Boyd, R D ^a   Britten, J A ^a   Fernandez, A ^a   Hawryluk, A M ^a   Perry, M D ^a   Kania, D R ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000556927     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. C. O. Bozler, C. T. Harris, S. Rabe, D. D. Rathman, M. A. Hollis, and H. I. Smith, J. Vac. Sci. Technol. B 12, 626 (1994).
2. J. P. Spallas, A. M. Hawryluk, and D. R. Kania, J. Vac. Technol. B (in press).
3. Shipley Photoresist, Shipley Company, San Jose, CA.
4. E. H. Anderson, C. M. Horwitz, and H. I. Smith, Appl. Phys. Lett. 43, 874 (1983).
5. J. A. Britten, R. D. Boyd, and B. W. Shore, Opt. Eng. 34, 474 (1995).
6. J. A. Britten and I. M. Thomas, in Better Ceramics Through Chemistry V, edited by M. J. Hampden-Smith et al. (Materials Research Society, Pittsburgh, PA, 1992), Vol. 271, pp. 413-419.